As power densities rise and device geometries shrink, conventional semiconductor materials are reaching their limits. Diamond is emerging as a breakthrough material, offering exceptional thermal conductivity, wide bandgap, and electrical robustness for high‑power and high‑frequency applications.
This application note explores how Microwave Plasma Chemical Vapor Deposition (MPCVD) enables precise control of diamond purity, structure, and doping—accelerating adoption across advanced semiconductor, RF, and quantum technologies.
Explore how heteroepitaxial CVD diamond is being applied to thermal management layers, high‑performance substrates, and engineered quantum materials.
Download the application note to learn:
- Why CVD diamond outperforms traditional materials at extreme power densities
- How MPCVD enables tunable, device‑ready diamond films
- Where diamond delivers the greatest impact in next‑generation device architectures
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